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Suppression Fresnel reflection of nano-patterned silicon substrate formed by monolayer nanospheres

Chang-Rong Lin, Chia-Hua Chan, Shao-Ze Tseng, Chii-Chang Chen, and Sheng-Hui Chen

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Abstract

An anti-reflection nano-patterned silicon substrate (NPSiS) has been demonstrated by using self-assembly the single layer nano-sphere and ICP etching process. The average reflectivity of the NPSiS could be reduced to 0.79%.

© 2013 Optical Society of America

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