Abstract
We report on a novel maskless-lithography technique to fabricate three-dimensional microstructures via digital holography. The hologram design to generate 3D light field for photoresist exposure is optimized by a modified version of the direct-binary-search algorithm.
© 2012 Optical Society of America
PDF ArticleMore Like This
Matthieu C. R. Leibovici and Thomas K. Gaylord
FW1A.4 Frontiers in Optics (FiO) 2014
Quang Duc Pham, Satoshi Hasegawa, Akihiro Kiire, Daisuke Barada, Toyohiko Yatagai, and Yoshio Hayasaki
DTu3C.4 Digital Holography and Three-Dimensional Imaging (DH) 2012
Motofumi Fujii, Takashi Kakue, Peng Xia, Kenichi Ito, Tatsuki Tahara, Yuki Shimozato, Yasuhiro Awatsuji, Shogo Ura, Kenzo Nishio, Toshihiro Kubota, and Osamu Matoba
DTuC17 Digital Holography and Three-Dimensional Imaging (DH) 2011